Tungsten Oxide Based Hydrogen Gas Sensor Prepared by Advanced Magnetron Sputtering

In this study, we demonstrate the advantages of two advanced sputtering techniques for preparation a thin-film conductometric gas sensor. We combined tungsten oxide (WO3) thin films with other materials to achieve enhanced sensorial behavior towards hydrogen. Thin WO3 were prepared using DC and HiPIMS technique, which allowed us tune phase composition crystallinity by changing deposition parameters. The second material was then added on-top these films. used copper tungstate CuWO4 in form nano-islands deposited reactive rf Pd particles formed during conventional dc sputtering. specimens tested their response time-varied hydrogen concentration synthetic air at various temperatures. sensitivity time evaluated. performance individual is presented as well details synthesis. Advanced magnetron (such HiPIMS) property film improve its behavior. method compatible silicon electronics industry consists few steps that do not require any wet can be an as-deposited state. Therefore, nanostructured are very suitable use miniaturized electronic devices.